The Celexis Series of Shallow Trench Isolation (STI) slurries is a ceria-based high selectivity system which provides silica-like defectivity with excellent planarization expected of direct STI processes. Developed around mask layouts with a wide range of pattern densities, Celexis exhibits efficient and robust clearing behaviors needed to meet the tight tolerance requirements of 90nm and beyond design rules. Celexis features a new ceria particle produced with Nanophase Technologies' patented NanoArc™ Synthesis (NAS) process. The NAS process enables a new standard in reproducibility and control of the particle distribution and tail truncation—key attributes for achieving low defectivity and lot-to-lot consistency. Particle FeaturesThe NAS process from Nanophase employs a patented plasma technology that produces unique and very desirable properties in the base particle. These properties enable the following benefits: Highly controlled and repeatable particle size distribution High surface charge that enables stable dispersion properties Precisely controlled particle tail which enables low defectivity Discrete crystal morphology that eliminates the need for conventional milling—thereby eliminating potential contamination sources