Products / Rinsing and Cleaning / Water / Vector HTR
Substrate Rinse Additive Post Sawing, Lapping, & Polishing
Vector HTR Details
Product is available in 5-gallon pails and 55-gallon drums.
Gallium Arsenide, Germanium, Sapphire, Silicon, Silicon Carbide
Post wire-saw solar silicon wafers should be immersed while still mounted into a bath of 3% to 4% VECTOR HTR in DI water, to prevent slurry residues from adhering to wafers and improve the results of subsequent cleaning and etching processes.
Post-lapping or polishing, VECTOR HTR is used at dilutions ranging from 2% to 3%, depending on the condition and type of lapping equipment and the wafers.
After the lapping plate has lifted, VECTOR HTR should be flooded over the surface. This breaks the surface tension between the wafers and the plate, and removes any remaining contamination, which could cause scratching and complicate handling. Wafers can then be removed, re-rinsed and stored in a 2% HTR bath. For polishing applications follow the same dilution guidelines.
Product should be stored in a temperature controlled environment. Prolonged exposure to temperatures at or below 32° Fahrenheit (0°C) is discouraged. Prolonged exposure to temperatures at or above 100° Fahrenheit (38°C) is also discouraged. In addition, material should always be sealed when not in use to prevent evaporation.
Dispose of in accordance with all applicable local regulations.