Category - Polishing Pads

DF200

Standard CMP Backing Film

The original pad material created both for polishing and backing films, the DF200 continues to be an industry standard in many industries. As a finishing pad, it's quality construction yields excellent surface finish, lifetime, and...

Base MaterialCompressibilityThickness
Poromeric10 %25
Category - Polishing Pads

Dow® IC1000™ Polishing Pads

The Industry Standard for Chemical Mechanical Planarization

IC1000™ pad is the industry-standard polishing pad for chemical mechanical planarization (CMP). The IC1000 pad is made of a rigid, micro-porous polyurethane material. These properties enable the IC1000 pad to deliver localized planarization, excellent removal...

Applications: Berylium, Germanium, Indium Phosphide, Nickel, Polysilicon, Sapphire, Silicon Carbide, Tungsten, Zinc Selenide

Base MaterialCompressibilityHardnessHardness TestThickness
Urethane2.25 %57Shore D50
Category - Polishing Pads

Dow® IC1010™ Chemical Mechanical Polishing Pads

The Industry Standard for Chemical Mechanical Planarization

The IC1010™ polishing pad is designed for optimal chemical mechanical planarization (CMP) performance on the Applied Materials Mirra and Reflexion polisher platforms. The IC1010 pad is a rigid microporous polyurethane pad with a proprietary radial...

Applications: Berylium, Germanium, Indium Phosphide, Nickel, Polysilicon, Sapphire, Silicon Carbide, Tungsten, Zinc Selenide

Base MaterialCompressibilityHardnessHardness TestThickness
Urethane2.25 %57Shore D80
Category - Polishing Pads

Dow® IC1010™ Chemical Mechanical Polishing Pads with Window

The Industry Standard for Chemical Mechanical Planarization

The IC1010™ polishing pad is designed for optimal chemical mechanical planarization (CMP) performance on the Applied Materials Mirra and Reflexion polisher platforms. The IC1010 pad is a rigid microporous polyurethane pad with a proprietary radial...

Applications: Berylium, Germanium, Indium Phosphide, Nickel, Polysilicon, Sapphire, Silicon Carbide, Tungsten, Zinc Selenide

Base MaterialCompressibilityHardnessHardness TestThickness
Urethane2.25 %57Shore D80
Category - Polishing Pads

EXTERION(TM)

Exterion polishing pads

EXTERION pads are an advanced urethane with ceria filler, specifically formulated to meet the needs of different glass and optical polishing applications. The unique and controlled pore structure differenciate them from competitor pads in both performance...

Applications: Acryllic, Aluminosilicate, APEX, BK7, BK9, Borofloat, Borosilicate, Ceramic, Crystal Quartz, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Gorrilla, Leaded Crystal, Phosphate, Pyrex, SF6 Flint, Soda Lime - Float, Zinc Borosilicate

Base MaterialCompressibilityHardnessHardness TestThickness
Urethane3 %86JIS50
Category - Polishing Pads

FP5

Robust Poromeric Finishing Pad

Developed in-house by Eminess Technologies, the FP5 finishing pad offers a more robust alternative to Politex. In many applications it has demonstrated longer life to unique pore structure. It is a popular alternative for customers...

Applications: Cadmium Zinc Telluride, Gallium Arsenide

Base MaterialCompressibilityThickness
Poromeric12 %55.1
Category - Polishing Pads

GS Polishing Pad 0.150"

Polyurethane Impregnated Non-Woven Felt Pad

GS is a non-woven material which combines a uniform, moderately permeable pore structure with a firm, dense base. GS is ideal for aggressive polishing processes. The GS material is particularly effective in replacing wool and...

Applications: Glass, Zerodur

Base MaterialCompressibilityHardnessHardness TestThickness
Felt5 %45Shore D150
Category - Polishing Pads

GS Polishing Pad 0.180"

Polyurethane Impregnated Non-Woven Felt Pad

GS is a non-woven material which combines a uniform, moderately permeable pore structure with a firm, dense base. GS is ideal for aggressive polishing processes. The GS material is particularly effective in replacing wool and...

Applications: Glass, Zerodur

Base MaterialCompressibilityHardnessHardness TestThickness
Felt5 %45Shore D180
Category - Polishing Pads

GS Polishing Pad 0.220"

Polyurethane Impregnated Non-Woven Felt Pad

GS is a non-woven material which combines a uniform, moderately permeable pore structure with a firm, dense base. GS is ideal for aggressive polishing processes. The GS material is particularly effective in replacing wool and...

Applications: Glass, Zerodur

Base MaterialCompressibilityHardnessHardness TestThickness
Felt5 %45Shore D220
Category - Polishing Pads

IC OPTIC

IC Optic

Next generation optical surfaces will be manufactured in rigorous, predictive, process-controlled environments.   Recognizing that your polishing consumables require that same consistency, Eminess is pleased to offer IC OPTIC.  Made from the same controlled variation-free material...

Applications: Aluminosilicate, APEX, Berylium, BK7, BK9, Borofloat, Borosilicate, Ceramic, Cleartran - Zn Su Multi-spectral, Crystal Quartz, Fused, Fused Silica, Germanium, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Gorrilla, Leaded Crystal, Phosphate, Poly Carbonate lens, Pyrex, Quartz, SF6 Flint, Soda Lime - Float, Zerodur, Zinc, Zinc Borosilicate, Zinc Selenide, Zinc Sulfide

Base Material
Urethane
Category - Polishing Pads

MHN15A020

Advanced Polyurethane Pads

MH polishing pads are uniquely designed for polishing and finishing a wide variety of surfaces where flatness and ultra-precision surface finish is critical. These materials include glass surfaces, ceramic components, precision lenses, semiconductor wafers and...

Applications: Berylium, Cadmium Zinc Telluride, Calcium Fluoride, Fused Silica, Lithium Niobate, Lithium Tantalate, Sapphire, Stainless Steel

Base MaterialCompressibilityHardnessHardness TestThickness
Urethane3.05 %84JIS20
Category - Polishing Pads

MHN15A039

Advanced Polyurethane Pads

MH polishing pads are uniquely designed for polishing and finishing a wide variety of surfaces where flatness and ultra-precision surface finish is critical. These materials include glass surfaces, ceramic components, precision lenses, semiconductor wafers and...

Applications: Berylium, Cadmium Zinc Telluride, Calcium Fluoride, Fused Silica, Lithium Niobate, Lithium Tantalate, Sapphire, Stainless Steel

Base MaterialCompressibilityHardnessHardness TestThickness
Urethane3.05 %84JIS39
Category - Polishing Pads

MHN15A050

Advanced Polyurethane Pads

MH polishing pads are uniquely designed for polishing and finishing a wide variety of surfaces where flatness and ultra-precision surface finish is critical. These materials include glass surfaces, ceramic components, precision lenses, semiconductor wafers and...

Applications: Berylium, Cadmium Zinc Telluride, Calcium Fluoride, Fused Silica, Lithium Niobate, Lithium Tantalate, Sapphire, Stainless Steel

Base MaterialCompressibilityHardnessHardness TestThickness
Urethane3.05 %84JIS50
Category - Polishing Pads

MHS15A050

Advanced Polyurethane Pads for the Silicon Market

MH polishing pads are uniquely designed for polishing and finishing a wide variety of surfaces where flatness and ultra-precision surface finish is critical. These materials include glass surfaces, ceramic components, precision lenses, semiconductor wafers and...

Applications: Berylium, Cadmium Zinc Telluride, Calcium Fluoride, Fused Silica, Lithium Niobate, Lithium Tantalate, Sapphire, Stainless Steel

Base MaterialCompressibilityHardnessHardness TestThickness
Urethane3.05 %84JIS50
Category - Polishing Pads

OPC5350

Less Aggressive Variation of the OPC5150

OPC5350 is a grown-in-place poromeric on a urethane-impregnated woven substrate that incorporates a vertically-oriented pore structure similar to the Politex Supreme material, yet with a moderately less compressible and thinner substrate. This combination provides optimum...

Applications: Gallium Arsenide, Indium Phosphide, Lithium Niobate, Lithium Tantalate, Zinc Selenide

Base MaterialCompressibilityThickness
Poromeric14 %41
Category - Polishing Pads

OPC6350

Next Generation of the OPC5350

OPC6350 is a next generation version of the OPC5350. It is a grown-in-place poromeric on a urethane impregnated substrate that incorporates a vertically-oriented pore structure similar to the Politex Supreme material, yet with a moderately...

Applications: Gallium Arsenide, Indium Phosphide, Lithium Niobate, Lithium Tantalate, Zinc Selenide

Base MaterialCompressibilityThickness
Poromeric14 %43
Category - Polishing Pads

Optivision™

The Optivision™ pads is the newest generation of buffing pads used in final polishing step.

The Optivision 4540 has a dual pore structure; a combination of small pores dispersed amongst larger pores. This pore structure is advantageous over other finishing pads due to the increased number of contact points. The...

Applications: Copper CMP, Fused Silica, Germanium, TEOS

Base MaterialCompressibilityThickness
Poromeric12 %60
Category - Polishing Pads

Politex™ Hi

Classic CMP Finishing Pad, Small Pore

Politex Hi was originally developed for final wafer polishing. It is manufactured from proprietary polyurethane and incorporates a unique, vertically oriented pore structure with a compressible substrate. The substrate is designed to instantaneously recover from...

Base MaterialCompressibilityThickness
Poromeric13.75 %60
Category - Polishing Pads

Politex™ Reg

Classic CMP Finishing Pad

Politex Supreme (sometimes referred to as Politex Reg), was originally developed for final wafer polishing. It is manufactured from proprietary polyurethane and incorporates a unique, vertically oriented pore structure with a compressible substrate. The substrate...

Applications: Aluminum, Berylium, Cadmium Zinc Telluride, Calcium Fluoride, Ceramic, Fused Silica, Glass, Indium Phosphide, Lithium Niobate, Lithium Tantalate, Nickel, Polysilicon, Silicon, Tungsten, Zerodur

Base MaterialCompressibilityThickness
Poromeric14.75 %56
Category - Polishing Pads

Politex™ Reg Embossed

Classic CMP Finishing Pad, Embossed

Embossed Politex was originally developed for final wafer polishing. It is manufactured from proprietary polyurethane and incorporates a unique, vertically oriented pore structure with a compressible substrate. The substrate is designed to instantaneously recover from...

Applications: Germanium, Glass, Silicon

Base MaterialCompressibilityThickness
Poromeric14.75 %56
Category - Polishing Pads

SPM3100

CMP Finishing Pad

The SPM3100 poromeric technology was developed for silicon final polishing, and has also been used in a variety of other materials where surface finish is defined by haze, microscratches, and light point defects. The SPM3100...

Applications: Berylium, Fused Silica, Germanium, Lithium Niobate, Lithium Tantalate, Silicon, Silicon Carbide

Base MaterialCompressibilityThickness
Poromeric5.75 %28
Category - Polishing Pads

Suba™ 1200

Polyurethane Impregnated Polyester Felt Pad

Suba polishing pads are polyurethane impregnated polyester felts. They are specifically designed for stock and intermediate polishing where achieving a high precision surface is critical. Suba pads should be used in combination with each other...

Applications: Cadmium Zinc Telluride, Lithium Niobate, Lithium Tantalate, Silicon Carbide

Base MaterialCompressibilityHardnessHardness TestThickness
Felt6 %80Shore D50
Category - Polishing Pads

Suba™ 400 0.125"

Polyurethane Impregnated Polyester Felt Pad

Similar in composition to Suba IV, the Suba 400 is manufactured over seas by Dow Nitta. This particular variation is unusual for it's thickness, making it suited for industrial applications.

Base MaterialCompressibilityHardnessHardness TestThickness
Felt10 %74Asker C125
Category - Polishing Pads

Suba™ 500

Polyurethane Impregnated Polyster Felt Pad

Suba polishing pads are polyurethane impregnated polyester felts. They are specifically designed for stock and intermediate polishing where achieving a high precision surface is critical. Suba pads should be used in combination with each other...

Applications: Berylium, Fused Silica, Indium Phosphide, Lithium Niobate, Lithium Tantalate, Sapphire, Silicon, Stainless Steel, Tungsten, Zerodur

Base MaterialCompressibilityHardnessHardness TestThickness
Felt13 %55Shore D50
Category - Polishing Pads

Suba™ 500 Embossed

Polyurethane Impregnated Polyster Felt Pad, Embossed

Suba polishing pads are polyurethane impregnated polyester felts. They are specifically designed for stock and intermediate polishing where achieving a high precision surface is critical. Suba pads should be used in combination with each other...

Applications: Berylium, Fused Silica, Indium Phosphide, Lithium Niobate, Lithium Tantalate, Sapphire, Silicon, Stainless Steel, Tungsten, Zerodur

Base MaterialCompressibilityHardnessHardness TestThickness
Felt13 %55Shore DO50
Category - Polishing Pads

Suba™ 500 Perforated

Polyurethane Impregnated Polyster Felt Pad, Perforated

Suba polishing pads are polyurethane impregnated polyester felts. They are specifically designed for stock and intermediate polishing where achieving a high precision surface is critical. Suba pads should be used in combination with each other...

Base MaterialCompressibilityHardnessHardness TestThickness
Felt13 %55Shore DO50