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  • Conditioners (7)

  • Edge Grinding (2)

  • Grinding and Slicing (12)

  • ID Slicing Blades (2)

  • Lapping Additives (8)

  • Molded Products (7)

  • Polishing Fixtures (7)

  • Polishing Pads (35)

  • Polishing Slurries (132)

  • Rinsing and Cleaning (2)

  • Sonic Cleaning (13)

  • Wafering Adhesives (7)

Company Brands (cb)

  • DuPont®

  • Eminess™

  • Intersurface Dynamics

  • Nalco™

  • SMI

  • Valtech

Base Materials

  • Aluminum Oxide

  • Cerium Oxide

  • Colloidal Silica

  • Diamond

  • Epoxy

  • Felt

  • Fiberglass

  • Multiparticle Blend

  • Nylon

  • Polymer

  • Poromeric

  • Silicon Carbide

  • Stainless Steel

  • Urethane

  • Water

  • Zirconium

Applications

  • Acryllic (1)

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  • Cleartran - Zn Su Multi-spectral (1)

  • Copper CMP (1)

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Product Brands

  • Acuplane™

  • Celexis™

  • Challenge

  • IC1000™

  • Kinik®

  • Klebosol™

  • Nanopure™

  • Politex™

  • Suba™

  • Tensor

  • Ultra-Sol®

  • Valtron®

  • Vector

Category - Conditioners

Aluminum Oxide Dressing Stick

Non-aggressive ID Blade Cleaning and Conditioning Sticks

Semiconductor Materials, Inc (SMI) recommends that ID Slicing Blades be conditioned regularly to remove the buildup of sludge and epoxy, and also correct uneven diamond wear. The least aggressive dressing stick for ID blades, aluminum...

Base Material
Aluminum Oxide
Category - Conditioners

Black Silicon Carbide Dressing Stick

Aggressive ID Blade Dressing and Conditioning Sticks

Semiconductor Materials, Inc (SMI) recommends that ID Slicing Blades be conditioned regularly to remove the buildup of sludge and epoxy, and also correct uneven diamond wear. The most aggressive type dressing stick for ID blades,...

Base Material
Silicon Carbide
Category - Conditioners

Green Silicon Carbide Dressing Stick

Medium Aggresive ID Blade Dressing and Conditioning Sticks

Semiconductor Materials, Inc (SMI) recommends that ID Slicing Blades be conditioned regularly to remove the buildup of sludge and epoxy, and also correct uneven diamond wear. Considered a medium aggresive type dressing stick for ID...

Base Material
Silicon Carbide
Category - Conditioners

Kinik® CMP Nylon Brushes

Improving Pad Life and Process Consistency on Soft Pads

Kinik has developed a line of polishing pad brushes designed for use on poromeric and impregnated felt-based CMP "soft" pads. These pad conditioners use nylon brushes to dress and refresh the pad surface, typically...

Base Material
Nylon
Category - Conditioners

Kinik® Diagrid Pad Conditioners

Ideal for Improving Pad Life and Process Consistency

DiaGrid® pad conditioners incorporate many of the best features available in pad conditioning technology, making them ideal for the demands of today’s complex CMP processes. The product consists of a stainless steel base, overlaid with...

Base Material
Diamond
Category - Conditioners

Kinik® NSPD Fine Diamond Pad Conditioners

Improving Pad Life and Process Consistency on Soft Pads

Kinik has developed a line of “fine” diamond conditioners for soft pads (poromeric and impregnated felt pads) that reduce pad break-in time, pad micro-waviness and maintain polishing pad surface texture. These new NSPD discs...

Base Material
Diamond
Category - Conditioners

Kinik® Pyradia Pad Conditioners

Improving Pad Life and Process Consistency through Precision Diamond Placement

Kinik Pyradia disks utilize a combination of high diamond strength, diamond shaping technology, and individual fixed diamond placement to provide step-out pad conditioner pad performance, high uniformity and consistency, and reduced COO. This design...

Base Material
Diamond