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Polishing Pads
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Product Brands
Acuplane™
Celexis™
Challenge
IC1000™
Kinik®
Klebosol™
Nanopure™
Politex™
Suba™
Tensor
Ultra-Sol®
Valtron®
Vector
DF200
Standard CMP Backing Film
The original pad material created both for polishing and backing films, the DF200 continues to be an industry standard in many industries. As a finishing pad, it's quality construction yields excellent surface finish, lifetime, and...
Base Material | Compressibility | Thickness |
Poromeric | 10 % | 25 |
DuPont® IC1000™ Polishing Pads
The Industry Standard for Chemical Mechanical Planarization
IC1000™ pad is the industry-standard polishing pad for chemical mechanical planarization (CMP). The IC1000 pad is made of a rigid, micro-porous polyurethane material. These properties enable the IC1000 pad to deliver localized planarization, excellent removal...
Applications: Berylium, Germanium, Indium Phosphide, Nickel, Polysilicon, Sapphire, Silicon Carbide, Tungsten, Zinc Selenide
Base Material | Compressibility | Hardness | Hardness Test | Thickness |
Urethane | 2.25 % | 57 | Shore D | 50 |
DuPont® IC1010™ Chemical Mechanical Polishing Pads
The Industry Standard for Chemical Mechanical Planarization
The IC1010™ polishing pad is designed for optimal chemical mechanical planarization (CMP) performance on the Applied Materials Mirra and Reflexion polisher platforms. The IC1010 pad is a rigid microporous polyurethane pad with a proprietary radial...
Applications: Berylium, Germanium, Indium Phosphide, Nickel, Polysilicon, Sapphire, Silicon Carbide, Tungsten, Zinc Selenide
Base Material | Compressibility | Hardness | Hardness Test | Thickness |
Urethane | 2.25 % | 57 | Shore D | 80 |
DuPont® IC1010™ Chemical Mechanical Polishing Pads with Window
The Industry Standard for Chemical Mechanical Planarization
The IC1010™ polishing pad is designed for optimal chemical mechanical planarization (CMP) performance on the Applied Materials Mirra and Reflexion polisher platforms. The IC1010 pad is a rigid microporous polyurethane pad with a proprietary radial...
Applications: Berylium, Germanium, Indium Phosphide, Nickel, Polysilicon, Sapphire, Silicon Carbide, Tungsten, Zinc Selenide
Base Material | Compressibility | Hardness | Hardness Test | Thickness |
Urethane | 2.25 % | 57 | Shore D | 80 |
EXTERION(TM)
Exterion polishing pads
EXTERION pads are an advanced urethane with ceria filler, specifically formulated to meet the needs of different glass and optical polishing applications. The unique and controlled pore structure differenciate them from competitor pads in both performance...
Applications: Acryllic, Aluminosilicate, APEX, BK7, BK9, Borofloat, Borosilicate, Ceramic, Crystal Quartz, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Glass, Gorrilla, Leaded Crystal, Phosphate, Pyrex, SF6 Flint, Soda Lime - Float, Zinc Borosilicate
Base Material | Compressibility | Hardness | Hardness Test | Thickness |
Urethane | 3 % | 86 | JIS | 50 |
FP5
Robust Poromeric Finishing Pad
Developed in-house by Eminess Technologies, the FP5 finishing pad offers a more robust alternative to Politex. In many applications it has demonstrated longer life to unique pore structure. It is a popular alternative for customers...
Applications: Cadmium Zinc Telluride, Gallium Arsenide
Base Material | Compressibility | Thickness |
Poromeric | 12 % | 55.1 |
GS Polishing Pad 0.150"
Polyurethane Impregnated Non-Woven Felt Pad
GS is a non-woven material which combines a uniform, moderately permeable pore structure with a firm, dense base. GS is ideal for aggressive polishing processes. The GS material is particularly effective in replacing wool and...
Applications: Glass, Zerodur
Base Material | Compressibility | Hardness | Hardness Test | Thickness |
Felt | 5 % | 45 | Shore D | 150 |
GS Polishing Pad 0.180"
Polyurethane Impregnated Non-Woven Felt Pad
GS is a non-woven material which combines a uniform, moderately permeable pore structure with a firm, dense base. GS is ideal for aggressive polishing processes. The GS material is particularly effective in replacing wool and...
Applications: Glass, Zerodur
Base Material | Compressibility | Hardness | Hardness Test | Thickness |
Felt | 5 % | 45 | Shore D | 180 |
GS Polishing Pad 0.220"
Polyurethane Impregnated Non-Woven Felt Pad
GS is a non-woven material which combines a uniform, moderately permeable pore structure with a firm, dense base. GS is ideal for aggressive polishing processes. The GS material is particularly effective in replacing wool and...
Applications: Glass, Zerodur
Base Material | Compressibility | Hardness | Hardness Test | Thickness |
Felt | 5 % | 45 | Shore D | 220 |
IC OPTIC
IC Optic
Next generation optical surfaces will be manufactured in rigorous, predictive, process-controlled environments. Recognizing that your polishing consumables require that same consistency, Eminess is pleased to offer IC OPTIC. Made from the same controlled variation-free material...
Applications: Aluminosilicate, APEX, Berylium, BK7, BK9, Borofloat, Borosilicate, Ceramic, Cleartran - Zn Su Multi-spectral, Crystal Quartz, Fused, Fused Silica, Germanium, Glass, Gorrilla, Leaded Crystal, Phosphate, Poly Carbonate lens, Pyrex, Quartz, SF6 Flint, Soda Lime - Float, Zerodur, Zinc, Zinc Borosilicate, Zinc Selenide, Zinc Sulfide
Base Material |
Urethane |
MHN15A020
Advanced Polyurethane Pads
MH polishing pads are uniquely designed for polishing and finishing a wide variety of surfaces where flatness and ultra-precision surface finish is critical. These materials include glass surfaces, ceramic components, precision lenses, semiconductor wafers and...
Applications: Berylium, Cadmium Zinc Telluride, Calcium Fluoride, Fused Silica, Lithium Niobate, Lithium Tantalate, Sapphire, Stainless Steel
Base Material | Compressibility | Hardness | Hardness Test | Thickness |
Urethane | 3.05 % | 84 | JIS | 20 |
MHN15A039
Advanced Polyurethane Pads
MH polishing pads are uniquely designed for polishing and finishing a wide variety of surfaces where flatness and ultra-precision surface finish is critical. These materials include glass surfaces, ceramic components, precision lenses, semiconductor wafers and...
Applications: Berylium, Cadmium Zinc Telluride, Calcium Fluoride, Fused Silica, Lithium Niobate, Lithium Tantalate, Sapphire, Stainless Steel
Base Material | Compressibility | Hardness | Hardness Test | Thickness |
Urethane | 3.05 % | 84 | JIS | 39 |
MHN15A050
Advanced Polyurethane Pads
MH polishing pads are uniquely designed for polishing and finishing a wide variety of surfaces where flatness and ultra-precision surface finish is critical. These materials include glass surfaces, ceramic components, precision lenses, semiconductor wafers and...
Applications: Berylium, Cadmium Zinc Telluride, Calcium Fluoride, Fused Silica, Lithium Niobate, Lithium Tantalate, Sapphire, Stainless Steel
Base Material | Compressibility | Hardness | Hardness Test | Thickness |
Urethane | 3.05 % | 84 | JIS | 50 |
MHS15A050
Advanced Polyurethane Pads for the Silicon Market
MH polishing pads are uniquely designed for polishing and finishing a wide variety of surfaces where flatness and ultra-precision surface finish is critical. These materials include glass surfaces, ceramic components, precision lenses, semiconductor wafers and...
Applications: Berylium, Cadmium Zinc Telluride, Calcium Fluoride, Fused Silica, Lithium Niobate, Lithium Tantalate, Sapphire, Stainless Steel
Base Material | Compressibility | Hardness | Hardness Test | Thickness |
Urethane | 3.05 % | 84 | JIS | 50 |
Optivision™
The Optivision™ pads is the newest generation of buffing pads used in final polishing step.
The Optivision 4540 has a dual pore structure; a combination of small pores dispersed amongst larger pores. This pore structure is advantageous over other finishing pads due to the increased number of contact points. The...
Applications: Copper CMP, Fused Silica, Germanium, TEOS
Base Material | Compressibility | Thickness |
Poromeric | 12 % | 60 |
Politex™ Hi
Classic CMP Finishing Pad, Small Pore
Politex Hi was originally developed for final wafer polishing. It is manufactured from proprietary polyurethane and incorporates a unique, vertically oriented pore structure with a compressible substrate. The substrate is designed to instantaneously recover from...
Base Material | Compressibility | Thickness |
Poromeric | 13.75 % | 60 |
Politex™ Reg
Classic CMP Finishing Pad
Politex Supreme (sometimes referred to as Politex Reg), was originally developed for final wafer polishing. It is manufactured from proprietary polyurethane and incorporates a unique, vertically oriented pore structure with a compressible substrate. The substrate...
Applications: Aluminum, Berylium, Cadmium Zinc Telluride, Calcium Fluoride, Ceramic, Fused Silica, Glass, Indium Phosphide, Lithium Niobate, Lithium Tantalate, Nickel, Polysilicon, Silicon, Tungsten, Zerodur
Base Material | Compressibility | Thickness |
Poromeric | 14.75 % | 56 |
Politex™ Reg Embossed
Classic CMP Finishing Pad, Embossed
Embossed Politex was originally developed for final wafer polishing. It is manufactured from proprietary polyurethane and incorporates a unique, vertically oriented pore structure with a compressible substrate. The substrate is designed to instantaneously recover from...
Applications: Germanium, Glass, Silicon
Base Material | Compressibility | Thickness |
Poromeric | 14.75 % | 56 |
SPM3100
CMP Finishing Pad
The SPM3100 poromeric technology was developed for silicon final polishing, and has also been used in a variety of other materials where surface finish is defined by haze, microscratches, and light point defects. The SPM3100...
Applications: Berylium, Fused Silica, Germanium, Lithium Niobate, Lithium Tantalate, Silicon, Silicon Carbide
Base Material | Compressibility | Thickness |
Poromeric | 5.75 % | 28 |
Suba™ 1200
Polyurethane Impregnated Polyester Felt Pad
Suba polishing pads are polyurethane impregnated polyester felts. They are specifically designed for stock and intermediate polishing where achieving a high precision surface is critical. Suba pads should be used in combination with each other...
Applications: Cadmium Zinc Telluride, Lithium Niobate, Lithium Tantalate, Silicon Carbide
Base Material | Compressibility | Hardness | Hardness Test | Thickness |
Felt | 6 % | 80 | Shore D | 50 |
Suba™ 500
Polyurethane Impregnated Polyster Felt Pad
Suba polishing pads are polyurethane impregnated polyester felts. They are specifically designed for stock and intermediate polishing where achieving a high precision surface is critical. Suba pads should be used in combination with each other...
Applications: Berylium, Fused Silica, Indium Phosphide, Lithium Niobate, Lithium Tantalate, Sapphire, Silicon, Stainless Steel, Tungsten, Zerodur
Base Material | Compressibility | Hardness | Hardness Test | Thickness |
Felt | 13 % | 55 | Shore D | 50 |
Suba™ 500 Embossed
Polyurethane Impregnated Polyster Felt Pad, Embossed
Suba polishing pads are polyurethane impregnated polyester felts. They are specifically designed for stock and intermediate polishing where achieving a high precision surface is critical. Suba pads should be used in combination with each other...
Applications: Berylium, Fused Silica, Indium Phosphide, Lithium Niobate, Lithium Tantalate, Sapphire, Silicon, Stainless Steel, Tungsten, Zerodur
Base Material | Compressibility | Hardness | Hardness Test | Thickness |
Felt | 13 % | 55 | Shore DO | 50 |
Suba™ 500 Perforated
Polyurethane Impregnated Polyster Felt Pad, Perforated
Suba polishing pads are polyurethane impregnated polyester felts. They are specifically designed for stock and intermediate polishing where achieving a high precision surface is critical. Suba pads should be used in combination with each other...
Base Material | Compressibility | Hardness | Hardness Test | Thickness |
Felt | 13 % | 55 | Shore DO | 50 |
Suba™ 550
Polyurethane Impregnated Polyester Felt Pad
Suba polishing pads are polyurethane impregnated polyester felts. They are specifically designed for stock and intermediate polishing where achieving a high precision surface is critical. Suba pads should be used in combination with each other...
Applications: Ceramic
Base Material | Compressibility | Hardness | Hardness Test | Thickness |
Felt | 13 % | 55 | Shore D | 50 |
Suba™ 600
Polyurethane Impregnated Polyester Felt Pad
Suba polishing pads are polyurethane impregnated polyester felts. They are specifically designed for stock and intermediate polishing where achieving a high precision surface is critical. Suba pads should be used in combination with each other...
Applications: Sapphire
Base Material | Compressibility | Hardness | Hardness Test | Thickness |
Felt | 4 % | 80 | Asker C | 50 |
Suba™ 800
Polyurethane Impregnated Polyester Felt Pad
Suba polishing pads are polyurethane impregnated polyester felts. They are specifically designed for stock and intermediate polishing where achieving a high precision surface is critical. Suba pads should be used in combination with each other...
Applications: Sapphire
Base Material | Compressibility | Hardness | Hardness Test | Thickness |
Felt | 4 % | 82 | Asker C | 50 |